100 ml
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Dr.Althea 345 Relief Cream Mist
Description
Product information
Description
brand
Texture
Cream
skin type
All skin types
Contains
Hyaluronic Acid
Madecassocide
Centella Asiatica
Panthenol
Rice starch
Meet the Dr.Althea 345 Relief Cream Mist, a moisturising facial mist suitable for all skin types. This mist is designed to instantly refresh, moisturise and nourish the skin throughout the day.
The formula contains, amongst other ingredients, hyaluronic acid, Centella Asiatica, madecassoside and panthenol, which help to soothe, moisturise and support the skin in cases of redness and irritation. The light mist texture ensures the product absorbs quickly without leaving a sticky feeling.
This facial mist acts as a refresher that instantly makes the skin feel more comfortable and helps to maintain hydration, both during the day and after cleansing or applying make-up.
- Hydrating
- Nourishing
- Anti-redness
- Calming
- Anti-irritation
- Strengthening
Article number: 1395925
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Product information
Ingredients
ORYZA SATIVA (RICE) BRAN WATER, 1,2-HEXANEDIOL, TRIETHYLHEXANOIN, GLYCERIN, HYDROGENATED POLY(C6-14 OLEFIN), TOCOPHEROL, WATER, BUTYLENE GLYCOL, METHYLPROPANEDIOL, PENTYLENE GLYCOL, STREPTOCOCCUS THERMOPHILUS FERMENT, PYRUS MALUS (APPLE) JUICE, PANTHENOL, HYDROLYZED HYALURONIC ACID, POLYQUATERNIUM-51, BETAINE, TRILAURATE-4 PHOSPHATE, CYNANCHUM ATRATUM EXTRACT, ALTHAEA ROSEA FLOWER EXTRACT, ORYZA SATIVA (RICE) EXTRACT, SEA SALT, ASPERGILLUS FERMENT, SODIUM PHYTATE, CITRIC ACID, MADECASSOSIDE, HYDROXYPROPYLTRIMONIUM HYALURONATE, CENTELLA ASIATICA LEAF EXTRACT, HOUTTUYNIA CORDATA EXTRACT, ALOE BARBADENSIS LEAF WATER, BIFIDA FERMENT EXTRACT, HYALURONIC ACID, SILANETRIOL, AVENA SATIVA (OAT) KERNEL EXTRACT, LACTOBACILLUS FERMENT, HYDROLYZED RICE PROTEIN, RICE AMINO ACIDS
The ingredients of a product may be changed. We always recommend checking the packaging for the most up-to-date ingredient list.
Manufacturer / Importer
PTN Healthcare GmbH
Am Kronberger Hang 2
65824
Schwalbach (de)
Product safety